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Ta2O5

Ta2O5

Ta2O5

Ta2O5

1

The preparation process , dielectric property and optical property of Ta2O5 thin film been deeply researched by investigators .

Ta2O5 薄膜的制备工艺、介电性能、光学性能等也是国内外研究者关注的热点。

2

The effects Of SiO2 protective layers and annealing on the laser-induced damage threshold (LIDT) of the films are investigated .

文中对 SiO2 保护层和退火对 Ta2O5 薄膜的激光损伤阈值的不同影响进行了研究。

3

Ta2O5 films are prepared on BK7 substrates with conventional electron beam evaporation deposition .

Ta2O5 薄膜采用传统的电子束蒸发方法沉积在 BK7 基底上。

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